Array substrate for transflective LCD device and method of fabricating the same

ABSTRACT

An array substrate for a transflective liquid crystal display device, including a substrate; at least one gate line and at least one gate electrode formed on the transparent substrate; a gate-insulating layer formed over the at least one gate line and the at least one gate electrode; a silicon layer formed on the gate-insulating layer, the silicon layer being positioned above the at least one gate electrode; a source electrode and a drain electrode formed on the silicon layer and spaced apart from each other with the silicon layer overlapped therebetween, wherein the at least one gate electrode, the source electrode, the drain electrode, and the silicon layer define a thin film transistor (TFT); at least one data line; a first passivation layer covering the at least one data line; a transparent electrode formed on the first passivation layer; and a reflective electrode formed on the transparent electrode.

[0001] This application claims the benefit of Korean patent applicationNos. 2000-64739 and 2000-64740, both filed on Nov. 1, 2000 in Korea,which is hereby incorporated by reference as if fully set forth herein.

BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The present invention relates to a liquid crystal display device,and more particularly to a transflective liquid crystal display (LCD)device implementing selectable reflective and transmissive modes.

[0004] 2. Discussion of the Related Art

[0005] Generally, a transflective LCD device has advantages of both atransmissive LCD device and a reflective LCD device. Because thetransflective LCD device uses a back light as well as an ambient lightsource, it is not dependent upon exterior light source conditions, andconsumes relatively low power.

[0006]FIG. 1 is an exploded perspective view illustrating a typicaltransflective LCD device. The transflective LCD device 11 includes anupper substrate 15 and a lower substrate 21 that are opposed to eachother, and a liquid crystal layer 23 interposed therebetween. The uppersubstrate 15 and the lower substrate 21 are called a color filtersubstrate and an array substrate, respectively. On the upper substrate15, a black matrix 16 and a color filter layer 17 including a pluralityof red (R), green (G), and blue (B) color filters are formed. The blackmatrix 16 surrounds each color filter such that an array matrix featureis formed. Further on the upper substrate 15, a common electrode 13 isformed to cover the color filter layer 17 and the black matrix 16.

[0007] On the lower substrate 21 opposing the upper substrate 15, thinfilm transistors (TFTs) “T”, as switching elements, are formed in shapeof an array matrix corresponding to the color filter layer 17. Inaddition, a plurality of crossing gate and data lines 25 and 27 arepositioned such that each TFT “T” is located near each crossing portionof the gate and data lines 25 and 27. The crossing gate and data linesdefine a pixel region “P”. On the pixel region “P”, a pixel electrode 19is formed. The pixel electrode 19 includes a transmissive portion “A”and a reflective portion “C”.

[0008]FIG. 2 is a schematic cross-sectional view illustrating operationmodes of the typical transflective LCD device 11. As shown, thetransflective LCD device 11 includes the upper substrate 15 having thecommon electrode 13, the lower substrate 21 having the pixel electrode19, the liquid crystal layer 23 interposed therebetween, and a backlight 41 disposed below the lower substrate 21. The pixel electrode 19includes a reflective electrode 19 b having a through-hole “A” and atransparent electrode 19 a positioned below the reflective electrode 19b. The transparent electrode 19 a is separated from the reflectiveelectrode 19 b by a passivation layer 20 interposed therebetween.

[0009] For a reflective mode, the transflective LCD device 11 uses afirst ray “B” of ambient light, which may radiate from an exteriornatural light source or from an exterior artificial light source. Thefirst ray “B” passes through the upper substrate 15 and is reflected bythe reflective electrode 19 b back through the liquid crystal layer 23,which is aligned by the application of an electric field between thereflective electrode 19 b and the common electrode 13. Accordingly, thealigned liquid crystal layer 23 controls the first ray “B” so as todisplay an image.

[0010] For a transmissive mode, the transflective LCD device 11 uses asecond ray “F” of light, which radiates from the back light 41. Thesecond ray “F” sequentially passes through the transparent electrode 19a, the through-hole “A” of reflective electrodes 19 b and the liquidcrystal layer 23 which is aligned by the application of an electricfield between the transparent electrode 19 a and the common electrode13. Accordingly, the aligned liquid crystal layer 23 controls the secondray “F” so as to display an image.

[0011]FIG. 3 is an expanded plan view illustrating a portion of an arraysubstrate for a conventional transflective LCD device. As shown in FIG.3, gate lines 25 are arranged in a transverse direction, and data lines27 are arranged perpendicular to the gate lines 25. Both the gate lines25 and the data lines 27 are formed upon an array substrate 21 (in FIG.1), and a pair of gate lines 25 and data lines 27 define a pixel region“P”. Each of thin film transistors (TFTs) “T” is arranged at a positionwhere both the gate line 25 and the data line 27 cross one another. Apixel electrode 19 comprising both a transparent electrode 19 a and areflective electrode 19 b is disposed on the pixel region “P” defined bythe gate line 25 and data line 27.

[0012] Each TFT “T” includes a gate electrode 32 to which a scanningsignal is applied, a source electrode 33 to which a video signal isapplied, and a drain electrode 35 which inputs the video signal to thepixel electrode 19. Further, each TFT “T” includes an active layer 34between the source electrode 33 and the drain electrode 35. A portion ofthe gate line 25 defines a storage capacitor “S” with a portion of thepixel electrode 19. Furthermore, gate pads 29 and data pads 31 arerespectively disposed at end portions of gate lines 25 and data lines27. The gate pads 29 and the data pads 31 are to be electricallyconnected with a drive IC (not shown).

[0013] Still referring to FIG. 3, the pixel electrode 19 is atransflective electrode having both the transparent electrode 19 a andthe reflective electrode 19 b. Specifically, the transparent electrode19 a is first formed on the pixel region “P”, and is electricallyconnected with the drain electrode 35. Then, the reflective electrode 19b is formed over the transparent electrode 19 a, and is alsoelectrically connected with the drain electrode 35 via the transparentelectrode 19 a. Thus, the reflective electrode 19 b has a through hole“A” corresponding to a transmissive portion of the LCD device 11 suchthat rays of back light 41 (in FIG. 2) can pass through the through hole“A” for function in the transmissive mode. Portion “C” of the reflectiveelectrode 19 b serves as a reflective portion of the LCD device 11 suchthat rays of the ambient light are thereby reflected.

[0014] In the above-mentioned structure, however, two patterningprocesses are respectively required when forming the transparentelectrode 19 a and the reflective electrode 19 b. At this time ofpatterning, the transparent electrode 19 a and the reflective electrode19 b are corroded by an etching solution due to Galvanic corrosion.Accordingly, to solve this problem, an insulator (e.g., the passivationlayer 20 of FIG. 2) is interposed between the transparent electrode 19 aand the reflective electrode 19 b.

[0015] With reference to FIGS. 4A to 4D, 5A to 5D and 6A to 6D, afabrication process for the conventional array substrate is explained.FIGS. 4A to 4D are sequential cross-sectional views taken along lineIV-IV of FIG. 3, FIGS. 5A to 5D are sequential cross-sectional viewstaken along line V-V of FIG. 3, and FIGS. 6A to 6D are sequentialcross-sectional views taken along line VI-VI of FIG. 3.

[0016] At first, as shown in FIGS. 4A, 5A and 6A, a first metal isdeposited and patterned upon a transparent substrate 21 such that a gatepad 29, a gate line 25, and a gate electrode 32 are formed. For thefirst metal, aluminum (Al) or aluminum neodymium (AlNd) isconventionally employed. The gate line 25 extends from and is connectedwith the gate pad 29, and the gate electrode 32 protrudes from the gateline 25 (in FIG. 3). Thereafter, a gate-insulating layer 43 is formed onthe transparent substrate 21 to cover the metal layer previously formed.The gate-insulating layer 43 may be an inorganic substance, such assilicon nitride (SiN_(x)) or silicon oxide (SiO₂). Subsequently,amorphous silicon (a-Si) and impurity-doped amorphous silicon (n⁺/p⁺a-Si) are formed in series on the gate-insulating layer 43. Theamorphous silicon and impurity-doped amorphous silicon aresimultaneously patterned to form an active layer 34 and an ohmic contactlayer 47, respectively. The active layer 34 is formed on thegate-insulating layer 43, particularly over the gate electrode 32 andthe ohmic contact layer 47 is formed on the active layer 34. Also, asource electrode 33 and a drain electrode 35 are formed of a secondmetal on the ohmic contact layer 47. By depositing and patterning thissecond metal, not only are the source electrode 33 and the drainelectrode 35 formed, but the data line 27, a capacitor electrode 49 anda data pad 31 are also formed on the gate-insulating layer 43 such thatthe source electrode 33 extends from the data line 27. The sourceelectrode 33 and the drain electrode 35 are spaced apart from each otherand respectively overlap opposite ends of the gate electrode 32. Thecapacitor electrode 49 overlaps a portion of the gate line 25 to definethe storage capacitor “S” of FIG. 3. Moreover, a portion of the ohmiccontact layer 47 between the source electrode 33 and drain electrode 35is eliminated to form a channel region “CH.”

[0017] Now referring to FIGS. 4B, 5B and 6B, a first passivation layer51 is formed on and over the above-mentioned intermediates by depositingan organic substance such as BCB (benzocyclobutene) or an acryl-basedresin. By patterning the first passivation layer 51, a first draincontact hole 53 that exposes a portion of the drain electrode 35 isformed. At this time, a first capacitor contact hole 57 and a first datapad contact hole 61 are also formed by patterning the first passivationlayer 51. Furthermore, by patterning both the first passivation layer 51and the gate-insulating layer 43, an etching hole 55 corresponding tothe through-hole “A” and a first gate pad contact hole 59 are formed.The first capacitor contact hole 57 exposes a portion of the capacitorelectrode 49, the first gate pad contact hole 59 exposes a portion ofthe gate pad 29, and the first data pad contact hole 61 exposes aportion of the data pad 31. Thereafter, a transparent conductivematerial, such as indium tin oxide (ITO) or indium zinc oxide (IZO), isdeposited upon the first passivation layer 51 having the holes andsubsequently patterned to form a transparent electrode 19 a, a gate padterminal 65 and a data pad terminal 67. The transparent electrode 19 aelectrically contacts the drain electrode 35 through the first draincontact hole 53, and the gate pad terminal 65 electrically contacts thegate pad 29 through the first gate pad contact hole 59. Additionally,the data pad terminal 67 electrically contacts the data pad 31 throughthe first data pad contact hole 61. At this point, the transparentelectrode 19 a preferably overlaps portions of the gate line 25 andcontacts the capacitor electrode 49, and thus the transparent electrode19 a and the capacitor electrode 49 acts as one capacitor electrode inthe storage capacitor “S”. Further, a portion of the gate line 25 actsas the other capacitor electrode in the storage capacitor “S”.

[0018] Next, as shown in FIGS. 4C, 5C and 6C, an insulating materialsuch as silicon oxide, for example, is deposited upon the transparentelectrode 19 a and subsequently patterned to form a second passivationlayer 69. The second passivation layer 69 comprises a second draincontact hole 53 a positioned over the drain electrode 35 and a secondcapacitor contact hole 57 a over the capacitor electrode 49. Thereafter,a third metal is deposited upon the second passivation layer 69 andsubsequently patterned to form a reflective electrode 19 b having athrough-hole “A”. The third metal is preferably aluminum (Al) oraluminum alloy (e.g., aluminum neodymium (AlNd)) which have lowresistance and high reflectance properties. The reflective electrode 19b electrically contacts the transparent electrode 19 a via the seconddrain contact hole 53 a and second capacitor contact hole 57 a such thatthe reflective electrode 19 b and the drain electrode 65 areelectrically interconnected. Namely, a first portion of the reflectiveelectrode 19 b is electrically connected with the drain electrode 35through the second drain contact hole 53 a, and a second portion of thereflective electrode 19 b is electrically connected with the capacitorelectrode 49 through the second capacitor contact hole 57 a.

[0019] Next, referring to FIGS. 4D, 5D and 6D, exposed portions of thesecond passivation layer 69 are patterned to form a second gate padcontact hole 59 a over the gate pad 29 and a second data pad contacthole 61 a over the data pad 31. Therefore, the conventional arraysubstrate for the LCD device is complete.

[0020] In the above-mentioned structure, the reason for forming theetching hole 55 corresponding the through-hole “A” is to get the uniformcolor purity of the light in both the transmissive mode and reflectivemode. Namely, by matching the light-passing distances between thetransmissive mode and reflective mode, the uniform color purity isachieved regardless of whether the ambient light is reflected in thereflective portion “C” or the artificial light passes through thetransmissive portion “A” (i.e., through-hole).

[0021] Further, since the second passivation layer 69 is disposedbetween the transparent electrode 19 a and the reflective electrode 19b, the electrode corrosion caused by the etching solution (that etchesthe reflective electrode 19 b) is prevented. Namely, Galvanic corrosioncaused by the etching solution between the transparent electrode 19 aand the reflective electrode 19 b does not occur due to the fact thatthe second passivation layer 69 prevents the corrosion of thetransparent electrode 19 a. Now the mechanism wherein the corrosion isprevented will be described below.

[0022] As well known, the equilibrium potential (oxidation potential) ofthe anode reaction of aluminum (Al) is lower than the equilibriumpotential (reduction potential) of the cathode reaction of thetransparent electrode, e.g., ITO or IZO. As a result, when Al andITO/IZO are brought into contact with each other and immersed in theetching solution for the reflective electrode, the Al and the ITO/IZOexchange electrons therebetween while Galvanic corrosion proceeds in theinterfaces between the Al, the etching solution and the ITO.

[0023] However, when forming the passivation layer 69 between thetransparent electrode 19 a and the reflective electrode 19 b, althoughGalvanic corrosion is prevented, additional processes, such as maskprocesses and patterning processes, are required. Namely, the secondpassivation layer 69, as shown in FIG. 4D, is patterned to open the gatepad terminal 65 and the data pad terminal 67.

[0024] Furthermore, if the gate-insulating layer 43 and the firstpassivation layer 51 are not formed properly, these insulator (thegate-insulating layer 43 and the first passivation layer 51) havedefects such as cracks and pin-holes therein. Thus, when etching thetransparent conductive material (ITO or IZO) to form the transparentelectrode 19 a, the corrosion of the transparent material occurs due tothe etching solution for the transparent conductive material. Namely, itis supposed that the transparent conductive material and the etchingsolution make contacts with the aluminum (patterned first metal) throughpin-holes or the like formed in the gate-insulating layer and the firstpassivation layer.

[0025] Accordingly, as mentioned before, the conventional arraysubstrate needs additional fabricating processes and consumes more timeand costs, and the gate line reacts with the transparent conductivematerial when defects are formed in the insulators, thereby decreasingthe manufacturing yield of the LCD device.

SUMMARY OF THE INVENTION

[0026] Accordingly, the present invention is directed to a transflectiveLCD device that substantially obviates one or more of the problems dueto limitations and disadvantages of the related art.

[0027] An object of the present invention is to provide a transflectiveLCD device having decreased manufacturing time and costs withoutGalvanic corrosion.

[0028] Another object of the present invention is to provide atransflective LCD device having increased manufacturing yield.

[0029] Additional features and advantages of the invention will be setforth in the description that follows and in part will be apparent fromthe description, or may be learned by practice of the invention. Theobjectives and other advantages of the invention will be realized andattained by the structure particularly pointed out in the writtendescription and claims hereof as well as the appended drawings.

[0030] To achieve these and other advantages and in accordance with thepurpose of the present invention, as embodied and broadly described, amethod of fabricating an array substrate for use in a transflectiveliquid crystal display device includes the steps of forming a gate line,a gate electrode and a gate pad all having a first layer and a secondlayer structure on a substrate; forming a gate-insulating layer on thesubstrate to cover the double-layered gate line, the double-layered gateelectrode and the double-layered gate pad; forming an active layer andan ohmic contact layer over the gate electrode; forming a data line,source and drain electrodes on the ohmic contact layer, a capacitorelectrode over the gate line and a data pad at the end of the data line;forming a first passivation layer to cover the data line, source anddrain electrodes, the capacitor electrode and the data pad, the firstpassivation layer having a first drain contact hole to the drainelectrode, a etching hole corresponding to a transmissive portion, afirst capacitor contact hole to the capacitor electrode, a first gatepad contact hole to the gate pad, and a data pad contact hole to thedata pad; forming a gate pad terminal, a data pad terminal and atransparent electrode in the transmissive portion, the gate pad terminalcontacting the gate pad through the first gate pad contact hole, thedata pad terminal contacting the data pad through the first data padcontact hole, and transparent electrode contacting the drain electrodeand capacitor electrode through the first drain and capacitor contactholes; forming a second passivation layer to cover the transparentelectrode, the gate pad terminal and the data pad terminal, the secondpassivation layer having a second drain contact hole over the drainelectrode, a second capacitor contact hole over the capacitor electrode,a second gate pad contact hole over the gate pad, and a second data padcontact hole over the data pad; forming a corrosion-resistant metallayer on the second passivation layer; forming an aluminum-based layeron the corrosion-resistant metal layer; and patterning thealuminum-based layer and the corrosion-resistant metal layer so as toform a double-layered reflective electrode and expose the gate padterminal and data pad terminal.

[0031] The first layers of the gate line, gate electrode and gate padare one of aluminum or aluminum neodymium. The second layers of the gateline, gate electrode and gate pad are titanium. The data line, sourceand drain electrodes, capacitor electrode and data pad are formed ofchromium. The gate-insulating layer is a material selected from a groupconsisting of silicon oxide or silicon nitride. The gate pad terminal,data pad terminal and transparent electrode are formed of a transparentconductive material selected from a group consisting of indium tinoxide, indium zinc oxide and indium tin zinc oxide. Thecorrosion-resistant metal is molybdenum, while the aluminum-based layeris aluminum neodymium.

[0032] In another aspect, a method of fabricating an array substrate foruse in a transflective liquid crystal display device includes the stepsof forming a gate line, a gate electrode and a gate pad all having asingle-layered structure on a substrate; forming a gate-insulating layeron the substrate to cover the gate line, the gate electrode and the gatepad; forming an active layer and an ohmic contact layer over the gateelectrode; forming a data line, source and drain electrodes on the ohmiccontact layer, a capacitor electrode over the gate line, and a data padat the end of the data line, thereby defining intermediate structures;forming a first passivation layer to cover the intermediate structures,the first passivation layer having a first drain contact hole to thedrain electrode, a etching hole corresponding to a transmissive portion,a first capacitor contact hole to the capacitor electrode, a gate padcontact hole to the gate pad, and a data pad contact hole to the datapad; forming a gate pad terminal, a data pad terminal and a transparentelectrode in the transmissive portion, the gate pad terminal contactingthe gate pad through the gate pad contact hole, the data pad terminalcontacting the data pad through the first data pad contact hole, andtransparent electrode contacting the drain electrode and capacitorelectrode through the first drain and capacitor contact holes; forming asecond passivation layer to cover the transparent electrode, the gatepad terminal and the data pad terminal, the second passivation layerhaving a second drain contact hole over the drain electrode and a secondcapacitor contact hole over the capacitor electrode; forming areflective electrode having the transmissive portion on the secondpassivation layer; and patterning the second passivation layer using adry etching method so as to expose the gate pad terminal and the datapad terminal.

[0033] In another aspect, a method of fabricating an array substrate foruse in a transflective liquid crystal display device includes the stepsof forming a gate line, a gate electrode and a gate pad on a substrate;forming a gate-insulating layer on the substrate to cover the gate line,the gate electrode and the gate pad; forming an active layer and anohmic contact layer over the gate electrode; forming a data line, sourceand drain electrodes on the ohmic contact layer, a capacitor electrodeover the gate line, and a data pad at the end of the data line, therebydefining first intermediate structures; forming a first passivationlayer to cover the first intermediate structures, the first passivationlayer having a first drain contact hole to the drain electrode, aetching hole corresponding to a transmissive portion, a first capacitorcontact hole to the capacitor electrode, a first gate pad contact holeto the gate pad, and a first data pad contact hole to the data pad;forming a gate pad terminal, a data pad terminal and a transparentelectrode in the transmissive portion, the gate pad terminal contactingthe gate pad through the first gate pad contact hole, the data padterminal contacting the data pad through the first data pad contacthole, and transparent electrode contacting the drain electrode andcapacitor electrode through the first drain and capacitor contact holes,thereby defining second intermediate structures; forming a secondpassivation layer to cover the second intermediate structures, thesecond passivation layer having a second drain contact hole over thedrain electrode, a second capacitor contact hole over the capacitorelectrode, a second gate pad contact hole over the gate pad, and asecond data pad contact hole over the data pad; forming acorrosion-resistant metal layer on the second passivation layer; formingan aluminum-based layer on the corrosion-resistant metal layer;patterning the aluminum-based layer so as to form a second layer of adouble-layered reflective electrode having a transmissive portion; andpattering the corrosion-resistant metal layer so as to form a firstlayer of the double-layered reflective electrode having the transmissiveportion.

[0034] In another aspect, a method of fabricating an array substrate foruse in a transflective liquid crystal display device includes the stepsof forming a gate line, a gate electrode and a gate pad on a substrate;forming a gate-insulating layer on the substrate to cover the gate line,the gate electrode and the gate pad; forming an active layer and anohmic contact layer over the gate electrode; forming a data line, sourceand drain electrodes on the ohmic contact layer, a capacitor electrodeover the gate line, and a data pad at the end of the data line, therebydefining first intermediate structures; forming a passivation layer tocover the first intermediate structures, the passivation layer having adrain contact hole to the drain electrode, a etching hole correspondingto a transmissive portion, a capacitor contact hole to the capacitorelectrode, a gate pad contact hole to the gate pad, and a data padcontact hole to the data pad; forming a gate pad terminal, a data padterminal and a transparent electrode in the transmissive portion, thegate pad terminal contacting the gate pad through the gate pad contacthole, the data pad terminal contacting the data pad through the data padcontact hole, and transparent electrode contacting the drain electrodeand capacitor electrode through the drain and capacitor contact holes,thereby defining second intermediate structures; laser-treating thetransparent electrode; forming a corrosion-resistant metal layer tocover the second intermediate structures; forming an aluminum-basedlayer on the corrosion-resistant metal layer; patterning thealuminum-based layer so as to form a second layer of a double-layeredreflective electrode having a transmissive portion; and pattering thecorrosion-resistant metal layer so as to form a first layer of thedouble-layered reflective electrode having the transmissive portion

[0035] In another aspect, a method of fabricating an array substrate foruse in a transflective liquid crystal display device includes the stepsof forming a gate line, a gate electrode and a gate pad on a substrate;forming a gate-insulating layer on the substrate to cover the gate line,the gate electrode and the gate pad; forming an active layer and anohmic contact layer over the gate electrode; forming a data line, sourceand drain electrodes on the ohmic contact layer, a capacitor electrodeover the gate line, and a data pad at the end of the data line, therebydefining first intermediate structures; forming a passivation layer tocover the first intermediate structures, the passivation layer having adrain contact hole to the drain electrode, a etching hole correspondingto a transmissive portion, a capacitor contact hole to the capacitorelectrode, a gate pad contact hole to the gate pad, and a data padcontact hole to the data pad; forming a gate pad terminal, a data padterminal and a transparent electrode in the transmissive portion, thegate pad terminal contacting the gate pad through the gate pad contacthole, the data pad terminal contacting the data pad through the data padcontact hole, and transparent electrode contacting the drain electrodeand capacitor electrode through the drain and capacitor contact holes,thereby defining second intermediate structures; laser-treating thetransparent electrode; forming a reflective metal layer to cover thesecond intermediate structures, the reflective metal layer having aenough thickness; forming a photo resist on the reflective metal layer;patterning the photo resist using a photolithography process to exposepotions of the reflective metal layer; etching half of the exposedreflective metal layer; removing the photo resist completely using a wetstripper; and etching the residual reflective metal layer so as to forma reflective electrode.

[0036] In another aspect, a transflective liquid crystal display deviceincludes a substrate; at least one gate line and at least one gateelectrode formed on the transparent substrate; a gate-insulating layerformed over the at least one gate line and the at least one gateelectrode; a silicon layer formed on the gate-insulating layer, thesilicon layer being positioned above the at least one gate electrode; asource electrode and a drain electrode formed on the silicon layer andspaced apart from each other with the silicon layer overlappedtherebetween, wherein the at least one gate electrode, the sourceelectrode, the drain electrode, and the silicon layer define a thin filmtransistor (TFT); at least one data line; a first passivation layercovering the at least one data line; a transparent electrode formed onthe first passivation layer; and a reflective electrode formed on thetransparent electrode.

[0037] It is to be understood that both the foregoing generaldescription and the following detailed description are exemplary andexplanatory and are intended to provide further explanation of theinvention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

[0038] The accompanying drawings, which are included to provide afurther understanding of the invention and are incorporated in andconstitute a part of this specification, illustrate embodiments of theinvention and together with the description serve to explain theprinciples of the invention. In the drawings:

[0039]FIG. 1 is an exploded perspective view illustrating a typicaltransflective LCD device;

[0040]FIG. 2 is a schematic cross-sectional view illustrating anoperation of a typical transflective LCD device;

[0041]FIG. 3 is an expanded plan view illustrating a portion of an arraysubstrate for a conventional transflective LCD device;

[0042]FIGS. 4A to 4D are sequential cross-sectional views taken alongline IV-IV of FIG. 3;

[0043]FIGS. 5A to 5D are sequential cross-sectional views taken alongline V-V of FIG. 3;

[0044]FIGS. 6A to 6D are sequential cross-sectional views taken alongline VI-VI of FIG. 3;

[0045]FIGS. 7A to 7F are sequential cross-sectional views taken alongline VII-VII of FIG. 3 according to a first embodiment of the presentinvention;

[0046]FIGS. 8A to 8F are sequential cross-sectional views taken alongline VIII-VIII of FIG. 3 according to the first embodiment of thepresent invention; FIGS. 9A to 9F are sequential cross-sectional viewstaken along line IX-IX of FIG. 3 according to the first embodiment ofthe present invention;

[0047]FIGS. 10A to 10D are sequential cross-sectional views taken alongline X-X of FIG. 3 according to a second embodiment of the presentinvention;

[0048]FIGS. 11A to 11D are sequential cross-sectional views taken alongline XI-XI of FIG. 3 according to the second embodiment of the presentinvention;

[0049]FIGS. 12A to 12D are sequential cross-sectional views taken alongline XII-XII of FIG. 3 according to the second embodiment of the presentinvention;

[0050]FIGS. 13A to 13C are sequential cross-sectional views taken alongline XIII-XIII of FIG. 3 according to a third embodiment of the presentinvention;

[0051]FIGS. 14A to 14C are sequential cross-sectional views taken alongline XIV-XIV of FIG. 3 according to the third embodiment of the presentinvention;

[0052]FIGS. 15A to 15C are sequential cross-sectional views taken alongline XV-XV of FIG. 3 according to the third embodiment of the presentinvention;

[0053]FIGS. 16A to 16C are sequential cross-sectional views taken alongline XVI-XVI of FIG. 3 according to a fourth embodiment of the presentinvention;

[0054]FIGS. 17A to 17C are sequential cross-sectional views taken alongline XVII-XVII of FIG. 3 according to the fourth embodiment of thepresent invention; and

[0055]FIGS. 18A to 18C are sequential cross-sectional views taken alongline XVIII-XVIII of FIG. 3 according to the fourth embodiment of thepresent invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0056] Reference will now be made in detail to the preferred embodimentsof the present invention, which are illustrated in the accompanyingdrawings. Wherever possible, the same reference numbers will be usedthroughout the drawings to refer to the same or like parts. In theprincipal of the present invention, a plan view and explanation thereofare omitted since a plan view of an inventive array substrate issomewhat similar to that of a conventional art shown in FIG. 3.

[0057]FIGS. 7A to 7F, 8A to 8F, and 9A to 9F are sequentialcross-sectional views respectively taken along lines VII-VII, VIII-VIII,IX-IX of FIG. 3 according to a first embodiment of the presentinvention. In the first embodiment of the present invention, the gateelectrode and gate line have double-layered structures using titanium(Ti) and aluminum-based material (e.g., aluminum neodymium (AlNd)).Furthermore, the reflective electrode also has double-layered structureusing molybdenum (Mo) and aluminum (Al).

[0058] Now, referring to FIGS. 7A, 8A and 9A, a first metal and a secondmetal are deposited on a substrate 111 and then patterned to form adouble-layered gate line 125 arranged transversely upon the substrate111, a double-layered gate pad 129 disposed at the end of thedouble-layered gate line 125 (in FIG. 3), and a double-layered gateelectrode 132 extending from the double-layered gated line 125. Thefirst metal for the first layers 125 a, 129 a and 132 a is substantiallyaluminum-based material, such as aluminum neodymium (AlNd), while thesecond metal for the second layers 125 b, 129 b and 132 b issubstantially titanium (Ti). Pure aluminum (Al) is conventionally usedas a metal for the gate line 125, gate pad 129 and gate electrode 132because of its low resistance and reduced signal delay. However, purealuminum is chemically weak when exposed to acidic processing and mayresult in formation of hillocks during high temperature processing.Accordingly, multi-layered aluminum structures, as shown in FIGS. 7A, 8Aand

[0059]9A, are used for the gate line 125, pad 129 and electrode 132.Since the second layers 125 b, 129 b and 132 b are formed of titanium(Ti), these second layers 125 b, 129 b and 132 b protect the firstlayers 125 a, 129 a and 132 a from the etching solution for thetransparent conductive material although the gate-insulating layer andthe passivation layer have cracks or pin-holes in a later steps, incontrast with the conventional art.

[0060] Next, referring to FIGS. 7B, 8B and 9B, a gate-insulating layer143 is formed upon the entire surface of the substrate 111 to cover thepatterned first and second metal layers. The gate-insulating layer 143includes at least an inorganic substance, such as silicon oxide (SiO₂)or silicon nitride (SiN_(x)). Thereafter, an amorphous silicon (a-Si)and an impurity-doped amorphous silicon are sequentially formed andsubsequently patterned into an island shape to form an active layer 134and an ohmic contact layer 147 upon the gate-insulating layer 143,especially over the double-layered gate electrode 132. Thereafter, athird metal, especially chrome (Cr), is deposited upon thegate-insulating layer 143 to cover the ohmic contact layer 147 and thenpatterned to form a data line 127, a source electrode 133, a drainelectrode 135, a capacitor electrode 149 and a data pad 131. The sourceelectrode 133 protrudes from the data line 127, and the drain electrode135 is spaced apart from the source electrode 133. The source electrode133 and the drain electrode 135 overlap end portions of the active layer134 with a center portion the active layer 134 positioned therebetween.

[0061] As mentioned before, the data line 127 is perpendicular to thedouble-layered gate line 125, and the data pad 131 is positioned at theend of the data line 127. The capacitor electrode 149 overlaps a portionof the double-layered gate line 125. An exposed portion of the ohmiccontact layer 147 is etched away between the source electrode 133 andthe drain electrode 135. At this point, since the top portions of thegate line 125, gate pad 129 and gate electrode 132 are formed oftitanium (Ti), the firstly formed metal (i.e., the gate line 125, thegate pad 129 and the gate electrode 132) are not eroded or deterioratedby the etchant for chrome (i.e., third metal) although thegate-insulating layer 143 has cracks or pin-holes.

[0062] Referring to FIGS. 7C, 8C and 9C, a first passivation layer 151is formed upon the source electrode 133, the drain electrode 135, thecapacitor electrode 149 and the data line 131. The first passivationlayer 151 includes at least one of an organic insulating material and aninorganic material. By patterning the first passivation layer 151, afirst drain contact hole 153 that exposes a portion of the drainelectrode 135 is formed. At this time, a first capacitor contact hole157 and a first data pad contact hole 161 are also formed by patterningthe first passivation layer 51. Furthermore, by patterning both thefirst passivation layer 151 and the gate-insulating layer 143, anetching hole 155 corresponding to the through-hole “A” and a first gatepad contact hole 159 are formed. The first capacitor contact hole 157exposes a portion of the capacitor electrode 149, the first gate padcontact hole 159 exposes a portion of the gate pad 29, and the firstdata pad contact hole 161 exposes a portion of the data pad 131.

[0063] Thereafter, a transparent conductive material, such as indium tinoxide (ITO), indium zinc oxide (IZO) or indium tin zinc oxide (ITZO), isdeposited upon the first passivation layer 151 having the holes andsubsequently patterned to form a transparent electrode 119 a, a gate padterminal 165 and a data pad terminal 167. The transparent electrode 119a electrically contacts the drain electrode 135 through the first draincontact hole 153, and the gate pad terminal 165 electrically contactsthe double-layered gate pad 129 through the first gate pad contact hole159. Additionally, the data pad terminal 167 electrically contacts thedata pad 131 through the first data pad contact hole 161. At this point,the transparent electrode 119 a preferably overlaps portions of thedouble-layered gate line 125 and contacts the capacitor electrode 149,and thus the transparent electrode 119 a and the capacitor electrode 149acts as a first capacitor electrode in the storage capacitor “S” (inFIG. 3). Further, a portion of the double-layered gate line 125 acts asa second capacitor electrode in the storage capacitor “S” (in FIG. 3).

[0064] Now referring to FIGS. 7D, 8D and 9D, an insulating material suchas silicon oxide or silicon nitride, for example, is deposited upon thetransparent electrode 119 a and subsequently patterned to form a secondpassivation layer 169. The second passivation layer 169 comprises asecond drain contact hole 153 a positioned over the drain electrode 135and a second capacitor contact hole 157 a over the capacitor electrode149. At this time, a second gate pad contact hole 159 a and a seconddata pad contact hole 161 a are also formed by patterning the secondpassivation layer 169. As shown in FIGS. 8D and 9D, the second gate padcontact hole 159 a exposes a portion of the double-layered gate pad 129,and the second data pad contact hole 161 a exposes a portion of the datapad 131.

[0065] Next, referring to FIGS. 7E, 8E and 9E, molybdenum (Mo) 166 andaluminum-based material (e.g. aluminum neodymium (AlNd)) 168 are formedin series upon the second passivation layer 159 having the secondcontact holes.

[0066] Thereafter, referring to FIGS. 7F, 8F and 9F, molybdenum (Mo) 166and aluminum-based material 168 are patterned using a mixed etchingsolution with phosphoric acid, acetic acid and nitric acid, therebyforming a first reflective electrode 166 a and a second reflectiveelectrode 168 a which have a through-hole “A”. The first reflectiveelectrode 166 a and the second reflective electrode 168 a act togetheras the reflective electrode 19 b of FIG. 4. The first and secondreflective electrodes 166 a and 168 a electrically contact thetransparent electrode 119 a via the second drain contact hole 153 a andsecond capacitor contact hole 157 a such that the first and secondreflective electrodes 166 a and 168 a and the drain electrode 135 areelectrically interconnected. Further, the etching hole 155 correspondingto the through-hole “A” is opened to form the transparent portion.Additionally, the gate pad terminal 165 and the data pad terminal 167are also exposed when forming the first and second reflective electrodes166 a and 168 a. Therefore, the array substrate for the LCD device iscomplete according to the first embodiment of the present invention.

[0067] As described before, the additional processes for forming thesecond gate pad contact hole 159 a and second data pad contact hole 161a are not required because these pad contact holes are formed togetherwith the etching hole 155 and second capacitor contact hole 157 a,thereby decreasing the manufacturing process and increasing themanufacturing yield. Furthermore, although the gate-insulating layer 143and the first passivation layer 151 have defects such as cracks orpin-holes, the firstly formed metal layer are not deteriorated due tothe fact that the top potion thereof is formed of titanium (Ti) havingcorrosion-resisting characteristics.

[0068]FIGS. 10A to 10D, 11A to 11D and 12A to 12D are sequentialcross-sectional views respectively taken along lines X-X, XI-XI andXII-XII of FIG. 3 according to a second embodiment of the presentinvention. In the second embodiment, the gate line, the gate pad, thegate electrode and the reflective electrode altogether havesingle-layered structures.

[0069] Referring to FIGS. 10A, 11A and 12A, a first metal is depositedand patterned upon a transparent substrate 111 such that a gate pad 129,a gate line 125, and a gate electrode 132 are formed. As a material forthe first metal, aluminum (Al), aluminum neodymium (AlNd), tungsten (W),chromium (Cr) or molybdenum (Mo) is conventionally employed.Alternatively, the gate line 125, gate pad 129 and the gate electrode132 can have the double-layered structures as described in the firstembodiment (in FIGS. 7A, 8A and 9A) of the present invention. The gateline 125 extends from and is connected with the gate pad 129, and thegate electrode 132 protrudes from the gate line 125 (in FIG. 3).Thereafter, a gate-insulating layer 143 is formed on the transparentsubstrate 111 to cover the metal layer previously formed. Thegate-insulating layer 143 may be an inorganic substance, such as siliconnitride (SiN_(x)) or silicon oxide (SiO₂). Subsequently, amorphoussilicon (a-Si) and impurity-doped amorphous silicon (n⁺/p⁺ a-Si) areformed in series on the gate-insulating layer 143. The amorphous siliconand impurity-doped amorphous silicon are simultaneously patterned intoan island shape to form an active layer 134 and an ohmic contact layer147, respectively. The active layer 134 is formed on the gate-insulatinglayer 143, particularly over the gate electrode 132, and the ohmiccontact layer 147 is formed on the active layer 134. Also, a sourceelectrode 133 and a drain electrode 135 are formed of a second metal onthe ohmic contact layer 147. By depositing and patterning this secondmetal, not only are the source electrode 133 and the drain electrode 135formed, but the data line 127, a capacitor electrode 149 and a data pad131 are also formed on the gate-insulating layer 143 such that thesource electrode 133 extends from the data line 127. The sourceelectrode 133 and the drain electrode 135 are spaced apart from eachother and respectively overlap opposite ends of the gate electrode 132.The capacitor electrode 149 overlaps a portion of the gate line 125 todefine the storage capacitor “S” of FIG. 3. Moreover, a portion of theohmic contact layer 147 between the source electrode 33 and drainelectrode 35 is eliminated to form a channel region.

[0070] Now referring to FIGS. 10B, 11B and 12B, a first passivationlayer 151 is formed on and over the above-mentioned intermediates bydepositing an organic substance, such as BCB (benzocyclobutene) or anacryl-based resin, or an inorganic substance, such as silicon oxide orsilicon nitride. By patterning the first passivation layer 151, a firstdrain contact hole 153 that exposes a portion of the drain electrode 135is formed. At this time, a first capacitor contact hole 157 and a firstdata pad contact hole 161 are also formed by patterning the firstpassivation layer 151. Furthermore, by patterning both the firstpassivation layer 151 and the gate-insulating layer 143, an etching hole155 corresponding to the through-hole “A” and a first gate pad contacthole 159 are formed. The first capacitor contact hole 157 exposes aportion of the capacitor electrode 149; the first gate pad contact hole159 exposes a portion of the gate pad 129; and the first data padcontact hole 161 exposes a portion of the data pad 131.

[0071] Thereafter, a transparent conductive material, such as indium tinoxide (ITO), indium zinc oxide (IZO) or indium tin zinc oxide (ITZO), isdeposited upon the first passivation layer 151 having the holes andsubsequently patterned to form a transparent electrode 119 a, a gate padterminal 165 and a data pad terminal 167. The transparent electrode 119a electrically contacts the drain electrode 135 through the first draincontact hole 153, and the gate pad terminal 165 electrically contactsthe gate pad 129 through the first gate pad contact hole 159.Additionally, the data pad terminal 167 electrically contacts the datapad 131 through the first data pad contact hole 161. At this point, thetransparent electrode 119 a preferably overlaps portions of the gateline 125 and contacts the capacitor electrode 149, and thus thetransparent electrode 119 a and the capacitor electrode 149 acts as afirst capacitor electrode in the storage capacitor “S” (in FIG. 3).Further, a portion of the gate line 125 acts as a second capacitorelectrode in the storage capacitor “S”.

[0072] Next, as shown in FIGS. 10C, 11C and 12C, an insulating materialsuch as silicon oxide, for example, is deposited upon the transparentelectrode 119 a and subsequently patterned to form a second passivationlayer 169. The second passivation layer 169 includes a second draincontact hole 153 a positioned over the drain electrode 135 and a secondcapacitor contact hole 157 a over the capacitor electrode 149.

[0073] Thereafter, a third metal is deposited upon the secondpassivation layer 169 and subsequently patterned to form a reflectiveelectrode 119 b having a through-hole “A”. The second metal ispreferably aluminum (Al) or aluminum alloy (e.g., aluminum neodymium(AlNd)) which have low resistance and high reflectance properties.Additionally, a photo resist (not shown) is used for patterning thethird metal. The reflective electrode 119 b electrically contacts thetransparent electrode 119 a via the second drain contact hole 153 a andsecond capacitor contact hole 157 a such that the reflective electrode119 b and the drain electrode 165 are electrically interconnected.Namely, a first portion of the reflective electrode 119 b iselectrically connected with the drain electrode 135 through the seconddrain contact hole 153 a, and a second portion of the reflectiveelectrode 119 b is electrically connected with the capacitor electrode149 through the second capacitor contact hole 157a.

[0074] Next, referring to FIGS. 10D, 11D and 12D, exposed portions ofthe second passivation layer 169 are patterned to exposed the gate padterminal 165 and data pad terminal 167. At this point, there are twomethods of patterning the second passivation layer 169.

[0075] In the first method of pattering the second passivation layer169, the photo resist for forming the reflective electrode 119 b isfirst removed and subsequently etches the exposed second passivationlayer 169 using a dry etching method. At this time, the reflectiveelectrode 119 b functions as a etch stopper. Therefore, the third metalfor the reflective electrode 119 b should be very resistant to the dryetching with the low resistance and high reflectance properties.

[0076] In the second method of patterning the second passivation layer169, the exposed second passivation layer 169 is first etched using adry etching method before removing the photo resist for the reflectiveelectrode 119 b. Further in the second method, an ash process isemployed to remove the photo resist for the reflective electrode 119 b.If the photo resist for the reflective electrode 119 b is removed by awet stipper using a wet etching method, Galvanic corrosion occursbetween the reflective electrode 119 b and the transparent electrode 119a because the wet stripper is an electrolytic solution. Therefore, whenusing the ash process for removing the photo resist, Galvanic corrosiondoes not occur between the reflective electrode 119 b and thetransparent electrode 119 a.

[0077] Accordingly, from one of the above-mentioned methods forpatterning the second passivation layer 169, the gate pad terminal 165and the data pad terminal are completely exposed. Additionally, thesecond passivation layer 169 only remains under the reflective electrode119 b, as shown in FIGS. 10D, 11D and 12D.

[0078] In the second embodiment of the present invention, since thesecond passivation layer is etched using the reflective electrode orphoto resist on the reflective electrode as masks, additional maskprocess is not required to expose the gate and data pad terminals.Therefore, the manufacturing processes are reduced.

[0079]FIGS. 13A to 13C, 14A to 14C and 15A to 15C are sequentialcross-sectional views respectively taken along lines XIII-XIII, XIV-XIVand XV-XV of FIG. 3 according to a third embodiment of the presentinvention. In the third embodiment, the gate line, the gate pad and thegate electrode altogether have single-layered structures, while thereflective electrode has a double-layered structure. Additionally, sinceFIGS. 13A, 14A and 15A are the same as FIGS. 10B, 11B and 12B of thesecond embodiment, the third embodiment of the present invention isbriefly described and some explanation of the third embodiment isomitted.

[0080] Referring to FIGS. 13A, 14A and 15A, a thin film transistor (TFT)“T” is formed on the substrate 111. The TFT “T” includes a gate line132, an active layer 134, an ohmic contact layer 147, a source electrode133 and a drain electrode 135. A gate-insulating layer 143 isolates thegate electrode 132 from the active layer 134 and the source and drainelectrodes 133 and 135. A gate line 125 is formed in one direction onthe substrate 111, and a gate pad 129 is positioned at the end of thegate line 125. The gate electrode 132 extends from the gate line 125,and the source electrode 133 extends from the data line 127. Whenforming the source and drain electrodes 133 and 135, a capacitorelectrode 149 over the gate line 125 and the data pad 131 are alsoformed. A first passivation layer 151, such as benzocyclobutene (BCB) oracryl-based resin, covers the TFT “T”, the capacitor electrode 149 andthe data pad 131. As shown in FIGS. 13A, 14A and 15A, the firstpassivation layer 151 has a first drain contact hole 153 to the drainelectrode 135, a first capacitor contact hole 157 to the capacitorelectrode 149, a first gate pad contact hole 159 to the gate pad 129, afirst data pad contact hole 161 to the data pad 131, and an etching hole155 corresponding to a through-hole (i.e., a transmissive portion) “A”.A transparent electrode 119 a, a gate pad terminal 165 and a data padterminal 167 are formed on the first passivation layer 151 by patterningthe transparent conductive material, such as ITO or IZO. A first portionof the transparent electrode 119 a contacts the drain electrode 135through the first drain contact hole 153, while a second portion of thetransparent electrode 119 a contacts the capacitor electrode 149 throughthe first capacitor contact hole 157. The gate pad terminal 165 and thedata pad terminal 167 have island shape, and contact the gate pad 129through the first gate pad contact hole 159 and the data pad 131 throughthe first data pad contact hole 161, respectively.

[0081] Now, referring to FIGS. 13B, 14B and 15B, an insulating materialis deposited upon the transparent electrode 119 a and subsequentlypatterned to form a second passivation layer 169. Here, the insulatingmaterial is an inorganic substance, such as silicon oxide or siliconnitride, or an organic substance, such as benzocyclobutene (BCB) oracryl-based resin. The second passivation layer 169 comprises a seconddrain contact hole 153 a positioned over the drain electrode 135 and asecond capacitor contact hole 157 a positioned over the capacitorelectrode 149. At this time, a second gate pad contact hole 159 a and asecond data pad contact hole 161 a are also formed by patterning thesecond passivation layer 169. The second gate pad contact hole 159 aexposes a portion of the gate pad 129, and the second data pad contacthole 161 a exposes a portion of the data pad 131.

[0082] Thereafter, a corrosion-resistant metal layer (a first layer)166, such as a chromium (Cr) layer, is formed on the second passivationlayer 169 having the second contact holes 153 a, 157 a, 159 a and 161 a.Subsequently, aluminum-based layer (a second layer) 168, such as Al orAlNd layer, is formed on the corrosion-resistant metal layer 166.Thereafter, the corrosion-resistant metal layer 166 and aluminum-basedlayer 168 are patterned using a mixed etching solution with phosphoricacid, acetic acid and nitric acid. If the corrosion-resistant metallayer 166 is formed of chromium (Cr), the etching solution includes aceric ammonium nitrate solution. Additionally, during this etchingprocess, the corrosion-resistant metal layer 166 protects the gate anddata pad terminals 165 and 167 from the etching solution for thealuminum-based layer 168.

[0083] From this etching process, formed are a first reflectiveelectrode 166 a and a second reflective electrode 168 a both having athrough-hole “A”, as shown in FIG. 13C. The first reflective electrode166 a and the second reflective electrode 168 a act together as thereflective electrode 119 b of FIG. 10D.

[0084] As shown in FIGS. 13C, 14C and 15C, the double-layered reflectiveelectrodes 166 a and 168 a contact the transparent electrode 119 a viathe second drain contact hole 153 a and second capacitor contact hole157 a such that the double-layered reflective electrodes 166 a and 168 aand the drain electrode 165 are electrically interconnected. Further,the etching hole 155 corresponding to the through-hole “A” is opened toform the transparent portion. Additionally, the gate pad terminal 165and the data pad terminal 167 are also exposed when forming thedouble-layered reflective electrodes 166 a and 168 a. Therefore, thearray substrate for the LCD device is complete according to the thirdembodiment of the present invention.

[0085] In the third embodiment described above, the second layer 168 ofthe double-layered reflective electrode is first etched, and then thefirst layer 166 of the double-layered reflective electrode is etched.Namely, aluminum-based layer 168 which causes Galvanic corrosion withthe transparent conductive material is etched before etching thecorrosion-resistant metal layer 166 which does not cause Galvaniccorrosion with the transparent conductive material. Therefore, the gatepad terminal 165 and the data pad terminal 167 are not deteriorated andcorroded when forming the double-layered reflective electrode.Furthermore, the additional processes are not required to expose thegate pad terminal 165 and the data pad terminal 167, unlike theconventional art.

[0086]FIGS. 16A to 16C, 17A to 17C and 18A to 18C are sequentialcross-sectional views respectively taken along lines XVI-XVI, XVII-XVIIand XVIII-XVIII of FIG. 3 according to a fourth embodiment of thepresent invention. In the fourth embodiment, the second passivationlayer between the transparent electrode and the reflective electrode isnot necessary, unlike the conventional art. Additionally, since FIGS.16A, 17A and 18A are the same as FIGS. 10B, 11B and 12B of the secondembodiment, the fourth embodiment of the present invention is brieflydescribed and some explanation of the fourth embodiment is omitted.

[0087] Referring to FIGS. 16A, 17A and 18A, a thin film transistor (TFT)“T” is formed on the substrate 111. The TFT “T” includes a gate line132, an active layer 134, an ohmic contact layer 147, a source electrode133 and a drain electrode 135. A gate-insulating layer 143 isolates thegate electrode 132 from the active layer 134 and the source and drainelectrodes 133 and 135. A gate line 125 is formed in one direction onthe substrate 111, and a gate pad 129 is positioned at the end of thegate line 125. The gate electrode 132 extends from the gate line 125,while the source electrode 133 extends from the data line 127. Whenforming the source and drain electrodes 133 and 135, a capacitorelectrode 149 over the gate line 125 and the data pad 131 are alsoformed. A passivation layer 151, such as benzocyclobutene (BCB) oracryl-based resin, is formed to cover the TFT “T”, the capacitorelectrode 149 and the data pad 131. As shown in FIGS. 16A, 17A and 18A,the passivation layer 151 has a drain contact hole 153 to the drainelectrode 135, a capacitor contact hole 157 to the capacitor electrode149, a gate pad contact hole 159 to the gate pad 129, a data pad contacthole 161 to the data pad 131, and an etching hole 155 corresponding to athrough-hole (i.e., a transmissive portion) “A”. A transparent electrode119 a, a gate pad terminal 165 and a data pad terminal 167 are formed onthe passivation layer 151 by patterning the transparent conductivematerial, such as ITO or IZO. A first portion of the transparentelectrode 119 a contacts the drain electrode 135 through the draincontact hole 153, while a second portion of the transparent electrode119 a contacts the capacitor electrode 149 through the capacitor contacthole 157. The gate pad terminal 165 and the data pad terminal 167 haveisland shape, and contact the gate pad 129 through the first gate padcontact hole 159 and the data pad 131 through the first data pad contacthole 161, respectively.

[0088] Now, referring to FIGS. 16B, 17B and 18B, a corrosion-resistantmetal layer (a first layer) 166, such as a chromium (Cr) or molybdenum(Mo) layer, is formed on the passivation layer 151 to cover thepatterned transparent conductive material. Subsequently, aluminum-basedlayer (a second layer) 168, such as Al or AlNd layer, is formed on thecorrosion-resistant metal layer 166. Therefore, a double-layeredstructure is complete for the double-layered reflective electrode.

[0089] Thereafter, a photolithography process is performed as follows.First, a photo resist is formed on the second layer 168 and exposed tothe light. The light-exposed portions of the photo resist is stripped toform a photo resist pattern 170, thereby exposing the second layer 168except for a portion for reflective electrode.

[0090] When removing the exposed portion of the second layer (thealuminum-based layer) 168, a mixed etching solution including phosphoricacid, acetic acid and nitric acid is used. However, when removing thefirst layer (the corrosion-resistant metal layer, e.g., chromium ormolybdenum) 166 to form the double-layered reflective layer, a mixedsolution with a ceric ammonium nitrate solution and nitric acid is usedas an etching solution.

[0091] In this fourth embodiment of the present invention, the firstlayer 166 should be thick enough to protect the transparent conductivematerial therebelow from the mixed etching solution for the second layer168. Namely, the first layer 166 prevents the etching solution for thesecond layer 168 from affecting the transparent electrode 119 a, gatepad terminal 165 and data pad terminal 167. The first layer 166 formedof Cr or Mo does not cause Galvanic corrosion with the transparentconductive material (e.g., ITO or IZO), thereby not deteriorating theelectrode 119 a and terminals 165 and 167 formed of transparentconductive material when etching the first layer 166.

[0092] Accordingly, since the first layer 166 and the second layer 168are etched respectively in the fourth embodiment of the presentinvention, Galvanic corrosion does not occur between the aluminum-basedlayer 168 and the layers formed of transparent conductive material.Furthermore, although chromium and molybdenum are mentioned for thefirst layer 166 in this reference, other metal layers that do notcorrosively reacts with the transparent conductive material can beemployed as a first layer 166.

[0093]FIGS. 16C, 17C and 18C are cross-sectional views showing an arraysubstrate according to the present invention after forming thedouble-layered reflective electrode 166 a and 168 a. In accordance withthe fourth embodiment of the present invention, since the double-layeredreflective electrode 166 a and 168 a is formed on and contacts thetransparent electrode 119 a, some additional processes may be required.Namely, the processes for removing the defects may be necessary becausethe electrons may be trapped in the interface between the transparentelectrode 119 and the first layer 166 a of the reflective electrode andthese trapped electrons cause the defects. In order to overcome thisproblem, the transparent electrode 119 a is laser-treated to improveelectrical and optical characteristics thereof.

[0094] Although the reflective electrode has the double-layeredstructure in the fourth embodiment of the present invention, asingle-layered structure can be employed in the reflective electrode. Atthis point, the reflective electrode is relatively thicker than theconventional art, and a dry etching method is used for patterning thethick reflective electrode. Namely, the opaque metal having highreflectance is deposited on the transparent electrode, and then thephotolithography process proceeds using a photo resist. At this time,half of the thick opaque metal layer, which is exposed for etching, isremoved by the dry etching method. Thereafter, the photo resistpatterned for the reflective electrode is stripped completely. Althoughthe wet stripper for the photo resist is an electrolytic solution, thetransparent electrode and pad terminals are not affected by this wetstripper because half-etched opaque metal layer covers the transparentelectrode and pad terminals. After stripping the photo resist, thehalf-etched opaque metal layer is removed using the dry etching method.At this time, a portion of the opaque metal layer where the photo resistpattern remained becomes the reflective electrode. Although the portionfor reflective electrode is half-etched, this properly functions as areflective electrode.

[0095] In the fourth embodiment of the present invention, the secondpassivation layer is not formed on the patterned transparent conductivematerial, and the reflective electrode is directly disposed on thetransparent electrode. Since the second passivation layer is omitted,the manufacturing processes are reduced in the fourth embodiment.Additionally, although the reflective electrode is formed on the surfaceof the transparent electrode, Galvanic corrosion does not occur in thefourth embodiment of the present invention.

[0096] It will be apparent to those skilled in the art that variousmodifications and variation can be made in the method of manufacturing athin film transistor of the present invention without departing from thespirit or scope of the invention. Thus, it is intended that the presentinvention cover the modifications and variations of this inventionprovided they come within the scope of the appended claims and theirequivalents.

What is claimed is:
 1. A method of fabricating an array substrate foruse in a transflective liquid crystal display device, the methodcomprising the steps of: forming a gate line, a gate electrode and agate pad all having a first layer and a second layer structure on asubstrate; forming a gate-insulating layer on the substrate to cover thedouble-layered gate line, the double-layered gate electrode and thedouble-layered gate pad; forming an active layer and an ohmic contactlayer over the gate electrode; forming a data line, source and drainelectrodes on the ohmic contact layer, a capacitor electrode over thegate line and a data pad at the end of the data line; forming a firstpassivation layer to cover the data line, source and drain electrodes,the capacitor electrode and the data pad, the first passivation layerhaving a first drain contact hole to the drain electrode, a etching holecorresponding to a transmissive portion, a first capacitor contact holeto the capacitor electrode, a first gate pad contact hole to the gatepad, and a data pad contact hole to the data pad; forming a gate padterminal, a data pad terminal and a transparent electrode in thetransmissive portion, the gate pad terminal contacting the gate padthrough the first gate pad contact hole, the data pad terminalcontacting the data pad through the first data pad contact hole, andtransparent electrode contacting the drain electrode and capacitorelectrode through the first drain and capacitor contact holes; forming asecond passivation layer to cover the transparent electrode, the gatepad terminal and the data pad terminal, the second passivation layerhaving a second drain contact hole over the drain electrode, a secondcapacitor contact hole over the capacitor electrode, a second gate padcontact hole over the gate pad, and a second data pad contact hole overthe data pad; forming a corrosion-resistant metal layer on the secondpassivation layer; forming an aluminum-based layer on thecorrosion-resistant metal layer; and patterning the aluminum-based layerand the corrosion-resistant metal layer so as to form a double-layeredreflective electrode and expose the gate pad terminal and data padterminal.
 2. The method of claim 1, wherein the first layers of the gateline, gate electrode and gate pad are one of aluminum or aluminumneodymium.
 3. The method of claim 1, wherein the second layers of thegate line, gate electrode and gate pad are titanium.
 4. The method ofclaim 1, wherein the data line, source and drain electrodes, capacitorelectrode and data pad are formed of chromium.
 5. The method of claim 1,wherein the gate pad terminal, data pad terminal and transparentelectrode are formed of a transparent conductive material selected froma group consisting of indium tin oxide, indium zinc oxide and indium tinzinc oxide.
 6. The method of claim 1, wherein the corrosion-resistantmetal is molybdenum.
 7. The method of claim 1, wherein thealuminum-based layer is aluminum neodymium.
 8. The method of claim 1,wherein the aluminum-based layer is pure aluminum.
 9. A method offabricating an array substrate for use in a transflective liquid crystaldisplay device, the method comprising the steps of: forming a gate line,a gate electrode and a gate pad all having a single-layered structure ona substrate; forming a gate-insulating layer on the substrate to coverthe gate line, the gate electrode and the gate pad; forming an activelayer and an ohmic contact layer over the gate electrode; forming a dataline, source and drain electrodes on the ohmic contact layer, acapacitor electrode over the gate line, and a data pad at the end of thedata line, thereby defining intermediate structures; forming a firstpassivation layer to cover the intermediate structures, the firstpassivation layer having a first drain contact hole to the drainelectrode, a etching hole corresponding to a transmissive portion, afirst capacitor contact hole to the capacitor electrode, a gate padcontact hole to the gate pad, and a data pad contact hole to the datapad; forming a gate pad terminal, a data pad terminal and a transparentelectrode in the transmissive portion, the gate pad terminal contactingthe gate pad through the gate pad contact hole, the data pad terminalcontacting the data pad through the first data pad contact hole, andtransparent electrode contacting the drain electrode and capacitorelectrode through the first drain and capacitor contact holes; forming asecond passivation layer to cover the transparent electrode, the gatepad terminal and the data pad terminal, the second passivation layerhaving a second drain contact hole over the drain electrode and a secondcapacitor contact hole over the capacitor electrode; forming areflective electrode having the transmissive portion on the secondpassivation layer; and patterning the second passivation layer using adry etching method so as to expose the gate pad terminal and the datapad terminal.
 10. The method of claim 9, wherein the gate line, gateelectrode and gate pad are formed of a material selected from a groupconsisting of aluminum, aluminum neodymium, tungsten, chromium andmolybdenum.
 11. The method of claim 9, wherein the first passivationlayer is formed of is a material selected from a group consisting ofsilicon oxide, silicon nitride, benzocyclobutene and acryl-based resin.12. The method of claim 9, wherein the gate pad terminal, data padterminal and transparent electrode are formed of a transparentconductive material selected from a group consisting of indium tinoxide, indium zinc oxide and indium tin zinc oxide.
 13. The method ofclaim 9, wherein the second passivation layer is formed of siliconoxide.
 14. The method of claim 9, wherein the second passivation layeris formed of silicon nitride.
 15. The method of claim 9, wherein thereflective electrode is formed of an aluminum-based resin selected froma group consisting of aluminum and aluminum-based material.
 16. Themethod of claim 9, wherein the patterning the second passivation layeruses the reflective electrode as a mask.
 17. The method of claim 9,wherein the patterning the second passivation layer uses a photo resistfor the reflective electrode as a mask.
 18. The method of claim 17,wherein the photo resist is removed using an ash process.
 19. A methodof fabricating an array substrate for use in a transflective liquidcrystal display device, the method comprising the steps of. forming agate line, a gate electrode and a gate pad on a substrate; forming agate-insulating layer on the substrate to cover the gate line, the gateelectrode and the gate pad; forming an active layer and an ohmic contactlayer over the gate electrode; forming a data line, source and drainelectrodes on the ohmic contact layer, a capacitor electrode over thegate line, and a data pad at the end of the data line, thereby definingfirst intermediate structures; forming a first passivation layer tocover the first intermediate structures, the first passivation layerhaving a first drain contact hole to the drain electrode, a etching holecorresponding to a transmissive portion, a first capacitor contact holeto the capacitor electrode, a first gate pad contact hole to the gatepad, and a first data pad contact hole to the data pad; forming a gatepad terminal, a data pad terminal and a transparent electrode in thetransmissive portion, the gate pad terminal contacting the gate padthrough the first gate pad contact hole, the data pad terminalcontacting the data pad through the first data pad contact hole, andtransparent electrode contacting the drain electrode and capacitorelectrode through the first drain and capacitor contact holes, therebydefining second intermediate structures; forming a second passivationlayer to cover the second intermediate structures, the secondpassivation layer having a second drain contact hole over the drainelectrode, a second capacitor contact hole over the capacitor electrode,a second gate pad contact hole over the gate pad, and a second data padcontact hole over the data pad; forming a corrosion-resistant metallayer on the second passivation layer; forming an aluminum-based layeron the corrosion-resistant metal layer; patterning the aluminum-basedlayer so as to form a second layer of a double-layered reflectiveelectrode having a transmissive portion; and pattering thecorrosion-resistant metal layer so as to form a first layer of thedouble-layered reflective electrode having the transmissive portion. 20.The method of claim 19, wherein the first passivation layer is formed ofone of benzocyclobutene and acryl-based resin.
 21. The method of claim19, wherein the gate pad terminal, data pad terminal and transparentelectrode are formed of a transparent conductive material selected froma group consisting of indium tin oxide and indium zinc oxide.
 22. Themethod of claim 19, wherein the second passivation layer is formed of isa material selected from a group consisting of silicon oxide, siliconnitride, benzocyclobutene and acryl-based resin.
 23. The method of claim19, wherein the corrosion-resistant metal layer is chromium.
 24. Themethod of claim 19, wherein the aluminum-based layer is one of aluminumand aluminum neodymium.
 25. The method of claim 19, wherein patteringthe aluminum-based layer uses a mixed etching solution with phosphoricacid, acetic acid and nitric acid.
 26. The method of claim 19, whereinpatterning the corrosion-resistant metal layer uses a ceric ammoniumnitrate solution.
 27. A method of fabricating an array substrate for usein a transflective liquid crystal display device, the method comprisingthe steps of: forming a gate line, a gate electrode and a gate pad on asubstrate; forming a gate-insulating layer on the substrate to cover thegate line, the gate electrode and the gate pad; forming an active layerand an ohmic contact layer over the gate electrode; forming a data line,source and drain electrodes on the ohmic contact layer, a capacitorelectrode over the gate line, and a data pad at the end of the dataline, thereby defining first intermediate structures; forming apassivation layer to cover the first intermediate structures, thepassivation layer having a drain contact hole to the drain electrode, aetching hole corresponding to a transmissive portion, a capacitorcontact hole to the capacitor electrode, a gate pad contact hole to thegate pad, and a data pad contact hole to the data pad; forming a gatepad terminal, a data pad terminal and a transparent electrode in thetransmissive portion, the gate pad terminal contacting the gate padthrough the gate pad contact hole, the data pad terminal contacting thedata pad through the data pad contact hole, and transparent electrodecontacting the drain electrode and capacitor electrode through the drainand capacitor contact holes, thereby defining second intermediatestructures; laser-treating the transparent electrode; forming acorrosion-resistant metal layer to cover the second intermediatestructures; forming an aluminum-based layer on the corrosion-resistantmetal layer; patterning the aluminum-based layer so as to form a secondlayer of a double-layered reflective electrode having a transmissiveportion; and pattering the corrosion-resistant metal layer so as to forma first layer of the double-layered reflective electrode having thetransmissive portion
 28. The method of claim 26, wherein the transparentelectrode is one of indium tin oxide and indium zinc oxide.
 29. Themethod of claim 26, wherein the corrosion-resistant metal layer is oneof chromium and molybdenum.
 30. The method of claim 26, wherein thealuminum-based layer is one aluminum and aluminum neodymium.
 31. Themethod of claim 26, wherein pattering the aluminum-based layer uses amixed etching solution with phosphoric acid, acetic acid and nitricacid.
 32. The method of claim 26, wherein patterning thecorrosion-resistant metal layer uses a ceric ammonium nitrate solution.33. A method of fabricating an array substrate for use in atransflective liquid crystal display device, the method comprising thesteps of: forming a gate line, a gate electrode and a gate pad on asubstrate; forming a gate-insulating layer on the substrate to cover thegate line, the gate electrode and the gate pad; forming an active layerand an ohmic contact layer over the gate electrode; forming a data line,source and drain electrodes on the ohmic contact layer, a capacitorelectrode over the gate line, and a data pad at the end of the dataline, thereby defining first intermediate structures; forming apassivation layer to cover the first intermediate structures, thepassivation layer having a drain contact hole to the drain electrode, aetching hole corresponding to a transmissive portion, a capacitorcontact hole to the capacitor electrode, a gate pad contact hole to thegate pad, and a data pad contact hole to the data pad; forming a gatepad terminal, a data pad terminal and a transparent electrode in thetransmissive portion, the gate pad terminal contacting the gate padthrough the gate pad contact hole, the data pad terminal contacting thedata pad through the data pad contact hole, and transparent electrodecontacting the drain electrode and capacitor electrode through the drainand capacitor contact holes, thereby defining second intermediatestructures; laser-treating the transparent electrode; forming areflective metal layer to cover the second intermediate structures, thereflective metal layer having a enough thickness; forming a photo resiston the reflective metal layer; patterning the photo resist using aphotolithography process to expose potions of the reflective metallayer; etching half of the exposed reflective metal layer; removing thephoto resist completely using a wet stripper; and etching the residualreflective metal layer so as to form a reflective electrode.
 34. Themethod of claim 32, wherein the transparent electrode is one of indiumtin oxide and indium zinc oxide.
 35. The method of claim 32, wherein thereflective metal layer is one aluminum and aluminum neodymium.
 36. Anarray substrate for use in a transflective liquid crystal displaydevice, comprising: a substrate; at least one gate line and at least onegate electrode formed on the transparent substrate; a gate-insulatinglayer formed over the at least one gate line and the at least one gateelectrode; a silicon layer formed on the gate-insulating layer, thesilicon layer being positioned above the at least one gate electrode; asource electrode and a drain electrode formed on the silicon layer andspaced apart from each other with the silicon layer overlappedtherebetween, wherein the at least one gate electrode, the sourceelectrode, the drain electrode, and the silicon layer define a thin filmtransistor (TFT); at least one data line; a first passivation layercovering the at least one data line; a transparent electrode formed onthe first passivation layer; and a reflective electrode formed on thetransparent electrode.
 37. The array substrate of claim 35, wherein thereflective electrode has a double-layered structure.
 38. The arrayssubstrate of claim 35, further comprising a second passivation layerbetween the transparent electrode and the reflective electrode.